Please use this identifier to cite or link to this item: https://doi.org/10.1186/1556-276X-7-449
Title: Highly flexible method for the fabrication of photonic crystal slabs based on the selective formation of porous silicon
Authors: Recio-Sánchez, G.
Dang, Z.
Torres-Costa, V.
Breese, M.B.H. 
Martín-Palma, R.-J.
Keywords: NanoPSi
Photonic band structure
Photonic slabs
Proton beam writing
Issue Date: 2012
Citation: Recio-Sánchez, G., Dang, Z., Torres-Costa, V., Breese, M.B.H., Martín-Palma, R.-J. (2012). Highly flexible method for the fabrication of photonic crystal slabs based on the selective formation of porous silicon. Nanoscale Research Letters 7 : -. ScholarBank@NUS Repository. https://doi.org/10.1186/1556-276X-7-449
Abstract: A novel fabrication method of Si photonic slabs based on the selective formation of porous silicon is reported. Free-standing square lattices of cylindrical air holes embedded in a Si matrix can be achieved by proton beam irradiation followed by electrochemical etching of Si wafers. The photonic band structures of these slabs show several gaps for the two symmetry directions for reflection through the z-plane. The flexibility of the fabrication method for tuning the frequency range of the gaps over the near- and mid-infrared ranges is demonstrated. This tunability can be achieved by simply adjusting the main parameters in the fabrication process such as the proton beam line spacing, proton fluence, or anodization current density. Thus, the reported method opens a promising route towards the fabrication of Si-based photonic slabs, with high flexibility and compatible with the current microelectronics industry. © 2012 Recio et al.
Source Title: Nanoscale Research Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/96803
ISSN: 19317573
DOI: 10.1186/1556-276X-7-449
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