Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/96684
Title: FT-IR study of the imidization process of photosensitive polyimide PMDA/ODA
Authors: Li, W.S. 
Shen, Z.X. 
Zheng, J.Z.
Tang, S.H. 
Keywords: Curing reaction process
Fourier transform infrared spectroscopy (FT-IR)
Imidization degree
Polyimide
Issue Date: Jul-1998
Source: Li, W.S.,Shen, Z.X.,Zheng, J.Z.,Tang, S.H. (1998-07). FT-IR study of the imidization process of photosensitive polyimide PMDA/ODA. Applied Spectroscopy 52 (7) : 985-989. ScholarBank@NUS Repository.
Abstract: Fourier transform infrared spectroscopy (FT-IR) was used to study the cure reaction process of an ester-type photosensitive polyimide, PMDA/ODA films coated on silicon wafer substrates. In the in situ high-temperature FT-IR study carried out in vacuum, all the characteristic peaks of imide and the crosslinkable group were observed to decrease gradually with an increase in temperature. The completion of the imidization reaction is at ∼270 °C. Our result shows that the ester-type photosensitive polyimide can be cured at a much lower temperature than previously reported. The imide peak δas(C, C > NC) at 588 cm-1 was used to follow the imidization process, and the result agrees well with that obtained by using another imide peak v(C-N-C) at 1378 cm-1. The film shrinks by one third during the cure process, and the temperature dependence of the film thickness shows excellent agreement with the "imidization degree".
Source Title: Applied Spectroscopy
URI: http://scholarbank.nus.edu.sg/handle/10635/96684
ISSN: 00037028
Appears in Collections:Staff Publications

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