Please use this identifier to cite or link to this item: https://doi.org/10.1016/S0218-625X(01)00149-X
Title: Dependence of thermal oxidation behavior of silicon nanocrystallites
Authors: Zhu, Y. 
Ong, P.P. 
Issue Date: 2001
Citation: Zhu, Y., Ong, P.P. (2001). Dependence of thermal oxidation behavior of silicon nanocrystallites. Surface Review and Letters 8 (5) : 565-568. ScholarBank@NUS Repository. https://doi.org/10.1016/S0218-625X(01)00149-X
Abstract: Three kinds of nanosilicon crystallites were prepared by different methods in high vacuum. All of them were composed of tiny silicon crystallites which were initially only mildly oxidized before annealing, but their behavior upon annealing in vacuum differed substantially depending on the environment in which they resided. XPS analyses revealed that the unencapsulated nanoparticles tended to oxidize quite quickly, whereas the nanoparticles sandwiched between layers of Al2O3 matrices were oxidized rather slowly even under intense annealing. In the zinc/silicon nanocrystalline mixture, the oxidation of the Si0 state was even faster than that of the intermediate Si1,+2,+3 states. Both the stability and formation processes of the Si-O bonds in the partially oxidized states differed considerably with different environmental surroundings. However, in all cases, the Si-O bonds of the fully oxidized Si+4 state remained the most stable, to which the less oxidized states tend to gravitate eventually.
Source Title: Surface Review and Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/96171
ISSN: 0218625X
DOI: 10.1016/S0218-625X(01)00149-X
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

1
checked on May 22, 2018

WEB OF SCIENCETM
Citations

1
checked on May 7, 2018

Page view(s)

22
checked on May 25, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.