Please use this identifier to cite or link to this item:
|Title:||Thermal and photoinduced covalent attachment of 3-Chloro-1-propanol on Si(100)-2× 1|
|Citation:||Shao, Y.X., Dong, D., Cai, Y.H., Wang, S., Ang, S.G., Xu, G.Q. (2010-10-14). Thermal and photoinduced covalent attachment of 3-Chloro-1-propanol on Si(100)-2× 1. Journal of Physical Chemistry C 114 (40) : 17159-17165. ScholarBank@NUS Repository. https://doi.org/10.1021/jp103945m|
|Abstract:||3-Chloro-1-propanol (HO-CH2-CH2-CH2-Cl) covalently binds onto Si(100)-2× 1 through the thermal dissociation of the OH group to form Si-O-CH2-CH2-CH2-Cl surface intermediates, evidenced by the appearance of the Si-H stretching mode (2110 cm-1) and the retention of C-Cl stretching mode (654 cm-1) in the high-resolution electron energy loss spectroscopy (HREELS) spectrum of chemisorbed 3-chloro-1-propanol molecules and the chemical downshift of O1s binding energy (BE) in the X-ray photoelectron spectroscopy (XPS) study. The C-Cl bonds in the chemisorbed 3-chloro-1-propanol can be cleaved upon 193 nm irradiation, resulting in Si-O-CH2CH2CH 2-CH2CH2CH2-O-Si through lateral diradical coupling. Upon covering the chemisorbed 3-chloro-1-propanol with physisorbed molecules, photoinduced diradical coupling between physisorbed and chemisorbed molecules was also evidenced, achieving the secondary attachment of 3-chloro-1-propanol on the Si surface and forming Si-O-CH2CH 2CH2-CH2CH2CH2-OH. © 2010 American Chemical Society.|
|Source Title:||Journal of Physical Chemistry C|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Feb 14, 2019
WEB OF SCIENCETM
checked on Feb 5, 2019
checked on Nov 9, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.