Please use this identifier to cite or link to this item: https://doi.org/10.1002/adma.200500762
Title: Nanoporous, ultralow-dielectric-constant fluoropolymer films from agglomerated and crosslinked hollow nanospheres of poly(pentafluorostyrene)-block-poly(divinylbenzene)
Authors: Fu, G.-D.
Shang, Z.
Hong, L. 
Kang, E.-T. 
Neoh, K.-G. 
Issue Date: 4-Nov-2005
Citation: Fu, G.-D., Shang, Z., Hong, L., Kang, E.-T., Neoh, K.-G. (2005-11-04). Nanoporous, ultralow-dielectric-constant fluoropolymer films from agglomerated and crosslinked hollow nanospheres of poly(pentafluorostyrene)-block-poly(divinylbenzene). Advanced Materials 17 (21) : 2622-2626. ScholarBank@NUS Repository. https://doi.org/10.1002/adma.200500762
Abstract: The fabrication of crosslinked and nanostructured fluoropolymer films with ultralow-κ was investigated. Dried SiO2 particles of about 25 nm in diameter, trichloro(4-chloromethylphenyl) silane, and 20 mL absolutely dry THF were introduced into a two-necked flask. Gel permeation chromatography (GPC), using THF as the eluent, was performed on an HP 1047A refractive index detector. The nanoporous fluoropolymer films, with porosity contributions from the interstitial spaces between the nanospheres and the core voids of the hollow spheres, exhibited a κ as low as 1.7.
Source Title: Advanced Materials
URI: http://scholarbank.nus.edu.sg/handle/10635/89562
ISSN: 09359648
DOI: 10.1002/adma.200500762
Appears in Collections:Staff Publications

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