Please use this identifier to cite or link to this item: https://doi.org/10.1039/c0jm02785e
Title: Some recent developments of polyhedral oligomeric silsesquioxane (POSS)-based polymeric materials
Authors: Wang, F.
Lu, X.
He, C. 
Issue Date: 7-Mar-2011
Citation: Wang, F., Lu, X., He, C. (2011-03-07). Some recent developments of polyhedral oligomeric silsesquioxane (POSS)-based polymeric materials. Journal of Materials Chemistry 21 (9) : 2775-2782. ScholarBank@NUS Repository. https://doi.org/10.1039/c0jm02785e
Abstract: Polyhedral Oligomeric Silsesquioxane (POSS) has attracted considerable interest in materials science due to its well-defined nano-scale organic-inorganic structure, which makes it an ideal building block for constructing nano-structured hybrid materials and nanocomposites. In this article, we highlight some recent developments in applications of POSS materials: 1) improving thermal and mechanical properties of polymers through incorporation of POSS into polymer matrices to form nanocomposites; 2) using POSS as a building block for design and synthesis of POSS-containing organic semiconductor materials to achieve high photo-luminescence/electron luminescence quantum efficiency in organic light emitting diodes and enhanced performance in electrochromatic devices; 3) exploiting POSS as a hydrophobic unit to develop amphiphilic polymers for drug/gene delivery and formation of hydrogels. A future direction for the development of POSS-containing materials is also proposed for applications in organic photovoltaic and other high-performance materials. © The Royal Society of Chemistry 2011.
Source Title: Journal of Materials Chemistry
URI: http://scholarbank.nus.edu.sg/handle/10635/86721
ISSN: 09599428
DOI: 10.1039/c0jm02785e
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

162
checked on Feb 21, 2019

WEB OF SCIENCETM
Citations

156
checked on Feb 5, 2019

Page view(s)

33
checked on Feb 1, 2019

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.