Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.materresbull.2011.07.030
Title: Resistive hysteresis in BiFeO3 thin films
Authors: Wu, J.
Wang, J. 
Xiao, D.
Zhu, J.
Keywords: A. Thin films
B. Sputtering
D. Electrical properties
Issue Date: Nov-2011
Citation: Wu, J., Wang, J., Xiao, D., Zhu, J. (2011-11). Resistive hysteresis in BiFeO3 thin films. Materials Research Bulletin 46 (11) : 2183-2186. ScholarBank@NUS Repository. https://doi.org/10.1016/j.materresbull.2011.07.030
Abstract: Capacitor-like Au/BiFeO3/SrRuO3 thin film with (1 1 1) orientation was grown on the SrTiO3 (1 1 1) substrate by radio frequency magnetic sputtering. It shows a resistive switching behavior, where a stable hysteresis in current-voltage curve was well developed by applying an optimum voltage at room temperature, and it reached the saturation at a bias voltage of 8 V. The Child's law in Vmax → 0 direction and the interface-limited Fowler-Nordheim tunneling in 0 → Vmax direction, together with the polarization reversal in the BiFeO3 barrier, are shown to involve in the observed resistive hysteresis. © 2011 Elsevier Ltd. All rights reserved.
Source Title: Materials Research Bulletin
URI: http://scholarbank.nus.edu.sg/handle/10635/86682
ISSN: 00255408
DOI: 10.1016/j.materresbull.2011.07.030
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.