Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.3097713
Title: The role of oxygen pressure and thickness on structure and pyroelectric properties of Ba (Ti0.85 Sn0.15) O3 thin films grown by pulsed laser deposition
Authors: Wang, S.J.
Lu, L. 
Lai, M.O. 
Fuh, J.Y.H. 
Issue Date: 2009
Citation: Wang, S.J., Lu, L., Lai, M.O., Fuh, J.Y.H. (2009). The role of oxygen pressure and thickness on structure and pyroelectric properties of Ba (Ti0.85 Sn0.15) O3 thin films grown by pulsed laser deposition. Journal of Applied Physics 105 (8) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.3097713
Abstract: The roles of oxygen pressure and thickness on the microstructure, electrical, and pyroelectric properties of Ba (Ti0.85 Sn 0.15) O3 (BTS) thin films have been studied. The highly (h00) -oriented BTS thin films were deposited on the SiO2 /Si substrates with a LaNiO3 layer as the bottom electrode by pulsed laser deposition. It was found that the texture and the microstructures of the as-deposited thin films are strongly dependent on the oxygen pressure, and that the BTS thin films deposited at higher oxygen pressures possess better electrical properties. The study on the thickness dependence of the dielectric and pyroelectric properties showed that the tensile stresses on the LNO and BTS thin films decreased as the thickness of the BTS film was increased. With the high textured thin film, a larger dielectric constant and pyroelectric coefficient were therefore achieved. © 2009 American Institute of Physics.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/85779
ISSN: 00218979
DOI: 10.1063/1.3097713
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