Nanoporous ultra-low-κ fluoropolymer composite films via plasma polymerization of allylpentafluorobenzene and magnetron sputtering of poly(tetrafluoroethylene)

Abstract

A approach to the fabrication of nanoporous ultra low dielectric constant fluoropolymer composite films was discussed. The dielectric constant of the nanoporous pp-AAFB films increased with an increase in radio frequency (RF) power used for deposition. It was observed that with an increase in RF power, the degree of defluorination of the ABFP rings and the complex aliphatic CF x structure in the pp-APFB films were enhanced. Analysis shows that the dielectric constant of the nanostructured fluoropolymer film can be fine tuned by changing the dry processing conditions, like RF power and deposition time.