Please use this identifier to cite or link to this item:
|Title:||Nanoporous ultra-low-κ fluoropolymer composite films via plasma polymerization of allylpentafluorobenzene and magnetron sputtering of poly(tetrafluoroethylene)|
|Source:||Fu, G.D.,Zhang, Y.,Kang, E.-T.,Neoh, K.-G. (2004-05-17). Nanoporous ultra-low-κ fluoropolymer composite films via plasma polymerization of allylpentafluorobenzene and magnetron sputtering of poly(tetrafluoroethylene). Advanced Materials 16 (9-10) : 839-842. ScholarBank@NUS Repository.|
|Abstract:||A approach to the fabrication of nanoporous ultra low dielectric constant fluoropolymer composite films was discussed. The dielectric constant of the nanoporous pp-AAFB films increased with an increase in radio frequency (RF) power used for deposition. It was observed that with an increase in RF power, the degree of defluorination of the ABFP rings and the complex aliphatic CF x structure in the pp-APFB films were enhanced. Analysis shows that the dielectric constant of the nanostructured fluoropolymer film can be fine tuned by changing the dry processing conditions, like RF power and deposition time.|
|Source Title:||Advanced Materials|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Feb 16, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.