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|Title:||Stress-induced leakage current in thin oxides under high-field impulse stressing|
|Citation:||Tan, Y.N.,Chim, W.K.,Lim, P.S. (2001). Stress-induced leakage current in thin oxides under high-field impulse stressing. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA : 228-233. ScholarBank@NUS Repository.|
|Abstract:||Stress-induced leakage current, or SILC, decreases when the time-between-pulses (Tbp) of an ac-pulse waveform is increased. The amount of SILC reduction generally decreases for the same increase in Tbp, with increasing stress voltage magnitude and stress pulse width. A model developed to describe the trap generation and relaxation processes occuring during transient high-field stress from unipolar and bipolar pulse waveforms is presented in this paper.|
|Source Title:||Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA|
|Appears in Collections:||Staff Publications|
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