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|Title:||Self-rectifying and forming-free unipolar HfO x based-high performance RRAM built by fab-avaialbe materials|
|Citation:||Tran, X.A.,Gao, B.,Kang, J.F.,Wu, X.,Wu, L.,Fang, Z.,Wang, Z.R.,Pey, K.L.,Yeo, Y.C.,Du, A.Y.,Liu, M.,Nguyen, B.Y.,Li, M.F.,Yu, H.Y. (2011). Self-rectifying and forming-free unipolar HfO x based-high performance RRAM built by fab-avaialbe materials. Technical Digest - International Electron Devices Meeting, IEDM : 31.2.1-31.2.4. ScholarBank@NUS Repository. https://doi.org/10.1109/IEDM.2011.6131648|
|Abstract:||In this paper, we report a high performance, forming-free and self-rectifying unipolar HfO x based RRAM fabricated by fab-available materials. Highlight of the demonstrated RRAM include 1) CMOS technology friendly materials and process, 2) excellent self-rectifying behavior in LRS (>10 3 @ 1 V), 3) forming-free unipolar resistive switching, 4) wide read-out margin for high density cross-point memory devices (number of word-line >10 6 for worst case condition). © 2011 IEEE.|
|Source Title:||Technical Digest - International Electron Devices Meeting, IEDM|
|Appears in Collections:||Staff Publications|
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