Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/84095
Title: Physical analysis of Ti-migration in 33 Å gate oxide breakdown
Authors: Pey, K.L. 
Tung, C.H. 
Lin, W.H.
Radhakrishnan, M.K. 
Issue Date: 2002
Citation: Pey, K.L.,Tung, C.H.,Lin, W.H.,Radhakrishnan, M.K. (2002). Physical analysis of Ti-migration in 33 Å gate oxide breakdown. Annual Proceedings - Reliability Physics (Symposium) : 210-215. ScholarBank@NUS Repository.
Abstract: Abnormal titanium migration in the poly-Si gate and transistor channel near the source/drain extension was discovered in Ti-silicided 0.18 × 0.40 μm2 MOSFETs after constant voltage stress of 5.1V at 100 °C during gate dielectric breakdown study. Coupled with a soft breakdown event, lateral titanium migration from the source/drain active Si regions and titanium downward protrusion within the poly-Si gate take place. This leads to a Ti-silicide migration induced enhanced junction leakage and a degraded transistor performance. Even though the transistor still functions electrically, this new degradation phenomenon may lead to early failure in the device, posing a reliability concern. We postulate that the abnormal titanium migration was triggered by an enhanced localized current density induced through the breakdown spot in the gate dielectric, leading to an extraordinary titanium migration due to the presence of the high magnitude of electrical driving force [1]. We call this new mechanism dielectric breakdown induced-silicide migration (DBIM). A similar phenomenon has not been observed so far in cobalt-silicided 0.15μm transistor fabricated with 25Å gate oxide.
Source Title: Annual Proceedings - Reliability Physics (Symposium)
URI: http://scholarbank.nus.edu.sg/handle/10635/84095
ISSN: 00999512
Appears in Collections:Staff Publications

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