Please use this identifier to cite or link to this item:
|Title:||SiGe amorphization during Ge condensation in silicon germanium on insulator|
|Citation:||Balakumar, S., Lo, G.Q., Tung, C.H., Kumar, R., Balasubramanian, N., Kwong, D.L., Ong, C.S., Li, M.F. (2006). SiGe amorphization during Ge condensation in silicon germanium on insulator. Applied Physics Letters 89 (4) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2222341|
|Abstract:||High temperature oxidation and annealing are found to be desirable to achieve a uniform germanium (Ge) profile in silicon germanium on insulator (SGOI) layers formed using germanium condensation technique. This work investigates the amorphization mechanism, which was considered as an undesirable consequence of lowering the temperature during Ge condensation when oxidations are conducted at 900 or 950°C. A dual layer SGOI stack, composed of an amorphous layer above a crystalline layer, was obtained at low temperature condensation as characterized using transmission electron microscope and Auger analysis. A possible mechanism is presented. Si0.4Ge0.6OI and Si0.25Ge0.75OI layers can be achieved without amorphization through oxidation/annealing at 1050°C and two oxidations at 1050 and 1000°C, respectively. © 2006 American Institute of Physics.|
|Source Title:||Applied Physics Letters|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Jul 9, 2018
WEB OF SCIENCETM
checked on Jun 26, 2018
checked on Jul 6, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.