Please use this identifier to cite or link to this item:
|Title:||Pulsed laser deposition of TiNi thin films at various temperatures|
|Authors:||Lu, Y.-F. |
Shape memory alloy
|Citation:||Lu, Y.-F.,Chen, X.-Y.,Ren, Z.-M.,Zhu, S.,Wang, J.-P.,Liew, T.Y.F. (2001-09). Pulsed laser deposition of TiNi thin films at various temperatures. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 40 (9 A) : 5329-5333. ScholarBank@NUS Repository.|
|Abstract:||Thin films of TiNi shape memory alloy (SMA) have been prepared by pulsed-laser deposition (PLD) at various substrate temperatures. X-ray photoelectron spectroscopy (XPS), surface profile measurements, and X-ray diffraction (XRD) are used to characterize the deposited films. The stoichiometry, deposition rate, and crystallinity of the films are investigated as functions of the substrate temperature. The deposition rates are of the order of 10-2 nm per pulse. The Ni content ranges from 46.7 to 52.0 at.%. It is found that the film deposited at a substrate temperature of 600°C has a polycrystalline structure and austenite is the major phase. It can be concluded that substrate temperature plays an important role in the composition control and the crystallization of the films. The martensitic transformation temperature of the annealed Ti-51.5 at.% Ni thin film is determined to be -20.8°C by differential scanning calorimetry (DSC).|
|Source Title:||Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Feb 8, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.