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https://doi.org/10.1063/1.1459760
Title: | Observation of memory effect in germanium nanocrystals embedded in an amorphous silicon oxide matrix of a metal-insulator-semiconductor structure | Authors: | Choi, W.K. Chim, W.K. Heng, C.L. Teo, L.W. Ho, V. Ng, V. Antoniadis, D.A. Fitzgerald, E.A. |
Issue Date: | 18-Mar-2002 | Citation: | Choi, W.K., Chim, W.K., Heng, C.L., Teo, L.W., Ho, V., Ng, V., Antoniadis, D.A., Fitzgerald, E.A. (2002-03-18). Observation of memory effect in germanium nanocrystals embedded in an amorphous silicon oxide matrix of a metal-insulator-semiconductor structure. Applied Physics Letters 80 (11) : 2014-2016. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1459760 | Abstract: | The memory effect of a trilayer structure (rapid thermal oxide/Ge nanocrystals in SiO2/sputtered SiO2) was investigated via capacitance versus voltage (C-V) measurements. The Ge nanocrystals were synthesized by rapid thermal annealing of the cosputtered Ge+SiO2 films. The memory effect was manifested by the hysteresis in the C-V curve. Transmission electron microscope and C-V results indicated that the hysteresis was due to Ge nanocrystals in the middle layer of the trilayer structure. © 2002 American Institute of Physics. | Source Title: | Applied Physics Letters | URI: | http://scholarbank.nus.edu.sg/handle/10635/82796 | ISSN: | 00036951 | DOI: | 10.1063/1.1459760 |
Appears in Collections: | Staff Publications |
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