Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/82696
Title: | Micromechanical resonators with sub-micron capacitive gaps in 2 μm process | Authors: | Shao, L.C. Palaniapan, M. Khine, L. Tan, W.W. |
Issue Date: | 2007 | Citation: | Shao, L.C., Palaniapan, M., Khine, L., Tan, W.W. (2007). Micromechanical resonators with sub-micron capacitive gaps in 2 μm process. Electronics Letters 43 (25) : 1427-1428. ScholarBank@NUS Repository. | Abstract: | An innovative gap reduction technique is reported to achieve sub-micron capacitive gaps for micromechanical resonators to boost the output signal using the standard low-cost 2m commercially available foundry process from MEMSCAP. Electrostatic actuation was used to reduce the gap size below the fabrication limitation. To demonstrate the proposed idea, a 6.35MHz Lamé-mode square resonator was designed, fabricated and tested. The resonator gap size was experimentally measured to be 0.64m, which boosted the resonance peak by 20dB. © The Institution of Engineering and Technology 2007. | Source Title: | Electronics Letters | URI: | http://scholarbank.nus.edu.sg/handle/10635/82696 | ISSN: | 00135194 |
Appears in Collections: | Staff Publications |
Show full item record
Files in This Item:
There are no files associated with this item.
Google ScholarTM
Check
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.