Please use this identifier to cite or link to this item: https://doi.org/10.1149/1.1455824
Title: Impacts of buffer oxide layer in nitride/oxide stack gate dielectrics on the device performance and dielectric reliability
Authors: Lin, W.H.
Pey, K.L. 
Dong, Z.
Lim, V.S.K.
Chooi, S.Y.M.
Zhou, M.S.
Ang, C.H.
Ang, T.C.
Lau, W.S.
Issue Date: Apr-2002
Source: Lin, W.H., Pey, K.L., Dong, Z., Lim, V.S.K., Chooi, S.Y.M., Zhou, M.S., Ang, C.H., Ang, T.C., Lau, W.S. (2002-04). Impacts of buffer oxide layer in nitride/oxide stack gate dielectrics on the device performance and dielectric reliability. Electrochemical and Solid-State Letters 5 (4) : F7-F9. ScholarBank@NUS Repository. https://doi.org/10.1149/1.1455824
Abstract: The device performance and reliability of nitride/oxide stack gate dielectrics with different buffer oxide thickness has been studied. The stack dielectrics were fabricated by in situ H (2%)/O2 anneal of chemical vapor deposited Si3N4. Ellipsometry data indicates the formation of SiO2 at the Si3N4/Si interface. With decreasing thickness of the buffer oxide, the gate leakage current reduced while the reliability and metal oxide semiconductor field effect transistor performance were degraded. The degradation in the reliability is attributed to the extension of structural strained layer into the Si3N4 bulk. Our results suggest that a buffer oxide of ∼10 Å is needed for the implementation of Si3N4 gate dielectric for future high performance complementary metal oxide semiconductor devices.
Source Title: Electrochemical and Solid-State Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/82500
ISSN: 10990062
DOI: 10.1149/1.1455824
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

Page view(s)

45
checked on Feb 12, 2018

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.