Please use this identifier to cite or link to this item:
|Title:||Dewetting of resist/metal bilayers in resist stripping processes|
|Authors:||Wu, Y. |
|Citation:||Wu, Y., Qiao, P., Chong, T., Low, T.-S., Xie, H., Luo, P., Guo, Z., Qiu, J. (2001-05-21). Dewetting of resist/metal bilayers in resist stripping processes. Applied Physics Letters 78 (21) : 3361-3363. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1374234|
|Abstract:||We report the observations of dewetting of resist/metal bilayers in a resist stripping process of nanofabrication in O2 plasma. The initiation of the dewetting process is tentatively associated with local heating caused by surface plasmon induced in metallic nanoparticles or nanowires. The surface patterns thus formed differ substantially from all the dewetting patterns reported so far, and they resemble trees at micrometer scale. The possible mechanism for the formation of this kind striking patterns is discussed and its implication to future nanoelectronics manufacturing is addressed. © 2001 American Institute of Physics.|
|Source Title:||Applied Physics Letters|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Sep 19, 2018
WEB OF SCIENCETM
checked on Sep 4, 2018
checked on Jun 29, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.