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https://scholarbank.nus.edu.sg/handle/10635/80663
| Title: | Laser-induced dry lift-off process | Authors: | Lu, Yong-Feng Aoyagi, Yoshinobu |
Issue Date: | 1995 | Citation: | Lu, Yong-Feng,Aoyagi, Yoshinobu (1995). Laser-induced dry lift-off process. Japanese Journal of Applied Physics, Part 2: Letters 34 (12 B) : L1669-L1670. ScholarBank@NUS Repository. | Abstract: | A dry lift-off process has been achieved using pulsed KrF excimer laser irradiation in air to remove AZ resist and to form SiO2 patterns on GaAs substrate. SiO2 patterns with a resolution of quarter-micron order can be obtained by this process. The process is attributed to the laser photodecomposition of the resist material. | Source Title: | Japanese Journal of Applied Physics, Part 2: Letters | URI: | http://scholarbank.nus.edu.sg/handle/10635/80663 | ISSN: | 00214922 |
| Appears in Collections: | Staff Publications |
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