Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/80390
Title: Electrical properties of rapid thermal oxides on Si1-x-yGexCy films
Authors: Bera, L.K. 
Choi, W.K. 
Feng, W.
Yang, C.Y.
Mi, J.
Issue Date: 10-Jul-2000
Source: Bera, L.K.,Choi, W.K.,Feng, W.,Yang, C.Y.,Mi, J. (2000-07-10). Electrical properties of rapid thermal oxides on Si1-x-yGexCy films. Applied Physics Letters 77 (2) : 256-258. ScholarBank@NUS Repository.
Abstract: The electrical characteristics of rapid thermal oxides on Si1-x-yGexCy layers are reported. X-ray photoelectron spectroscopy results indicate segregation of Ge at the SiO2/Si1-x-yGexCy interface, a thin GeO2 layer at the oxide surface, and elemental Ge at the interface and in the oxide. The interface state density of the samples ranges from 3.0×1011 to 3.6×1012 eV-1 cm-2. All the samples show electron trapping behavior and the trap generation rate decreases with increasing C concentration. The charge-to-breakdown value and the oxide breakdown field are higher for Si0.887Ge0.113 than for Si1-x-yGexCy samples, and these values decrease with increasing C concentration. © 2000 American Institute of Physics.
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/80390
ISSN: 00036951
Appears in Collections:Staff Publications

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