Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/80270
Title: A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface
Authors: Lu, Y.-F. 
Song, W.-D. 
Ye, K.-D. 
Lee, Y.-P.
Chan, D.S.H. 
Low, T.-S. 
Keywords: Adhesion force
Cleaning force
Cleaning model
Cleaning threshold
Laser cleaning
Particle removal
Quartz particle
Silicon substrate
Issue Date: 1-Oct-1997
Source: Lu, Y.-F.,Song, W.-D.,Ye, K.-D.,Lee, Y.-P.,Chan, D.S.H.,Low, T.-S. (1997-10-01). A cleaning model for removal of particles due to laser-induced thermal expansion of substrate surface. Japanese Journal of Applied Physics, Part 2: Letters 36 (10 PART A) : L1304-L1306. ScholarBank@NUS Repository.
Abstract: Taking Van der Waals force and cleaning force due to fast thermal expansion of substrate surface induced by pulsed laser irradiation into account, a cleaning model was established for removal of tiny particles from substrate surfaces. The cleaning condition and cleaning threshold can be obtained from this model. Theoretical predictions have been verified by the experimental results for removing quartz particles from silicon substrate. For laser-induced removal of quartz particles from silicon substrate surfaces, the cleaning threshold is about 135 mJ/cm2. Cleaning efficiency increases with increasing laser fluence, and large particles can be removed more easily than small ones.
Source Title: Japanese Journal of Applied Physics, Part 2: Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/80270
ISSN: 00214922
Appears in Collections:Staff Publications

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