Please use this identifier to cite or link to this item: https://doi.org/10.1021/jp8096549
Title: Selective dissociation of 4-Chloroaniline on the Si(111)-7×7 Surface through N-H bond breakage
Authors: Ying, H.C.
Yan, X.S.
Dong, D.
Hai, H.T.
Shuai, W. 
Guo, Q.X.
Issue Date: 12-Mar-2009
Citation: Ying, H.C., Yan, X.S., Dong, D., Hai, H.T., Shuai, W., Guo, Q.X. (2009-03-12). Selective dissociation of 4-Chloroaniline on the Si(111)-7×7 Surface through N-H bond breakage. Journal of Physical Chemistry C 113 (10) : 4155-4160. ScholarBank@NUS Repository. https://doi.org/10.1021/jp8096549
Abstract: The covalent attachment of 4-chloroaniline on the Si(111)-7×7 surface was investigated by using a combination of X-ray photoelectron spectroscopy (XPS), high-resolution electron energy loss spectroscopy (HREELS), and density functional theory (DFT) calculations. The HREELS spectra suggest that one of the N-H bonds dissociates to form Si-N and Si-H bonds with the phenyl ring and the C-Cl bond unperturbed upon chemisorption. The XPS results confirm that only the NH2 group participates in the surface binding. This binding mode and surface reaction pathway are further supported by the DFT calculation. The resulting chlorobenene-like structure on Si(111)-7×7 can be employed for further photochemical modification and functionalization. © 2009 American Chemical Society.
Source Title: Journal of Physical Chemistry C
URI: http://scholarbank.nus.edu.sg/handle/10635/76930
ISSN: 19327447
DOI: 10.1021/jp8096549
Appears in Collections:Staff Publications

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