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|Title:||Modeling and scheduling stepper operations in the photolithography process in wafer fabrication|
|Citation:||Ganesh, B.,Karimi, I.A. (2004). Modeling and scheduling stepper operations in the photolithography process in wafer fabrication. AIChE Annual Meeting, Conference Proceedings : 7825-7826. ScholarBank@NUS Repository.|
|Abstract:||The photolithography process, as a single stage, multi-product batch process with non-identical, parallel units, used in wafer fabrication is described. In the process, the wafer is exposed to a light source that passes through the reticle which holds the pattern of the circuitry for a particular layer with the use of steppers. A mathematical model has been developed to schedule the batches of integral lots using slot-based continuous-time representation. The model allows the scheduling of multiple slots of the same type of product/device in a single slot and hence is able to handle larger problems and hence solve faster.|
|Source Title:||AIChE Annual Meeting, Conference Proceedings|
|Appears in Collections:||Staff Publications|
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