Please use this identifier to cite or link to this item:
|Title:||Two masks process for high aspect ratio inertial sensors with ajustable range|
High aspect ratio
Inertial sensors with adjustable range
|Source:||Iliescu, C.,Avram, M.,Miao, J.,Tay, F.E.H.,Xu, G. (2004). Two masks process for high aspect ratio inertial sensors with ajustable range. Proceedings of the International Semiconductor Conference, CAS 1 : 263-266. ScholarBank@NUS Repository.|
|Abstract:||A two-mask process technology is proposed to fabricate silicon capacitive inertial sensors using comb drive structures. A conductive silicon wafer is anodically bonded on Pyrex glass substrate. The high aspect ratio silicon accelerometer structure was micromachined using DRIE and released from the glass substrate by further DRIE due to its notching effect. The spring stiffness was adjusted with another DRIE process. In this way, inertial sensors with different range can be process using same masks only by changing the spring stiffness. © 2004 IEEE.|
|Source Title:||Proceedings of the International Semiconductor Conference, CAS|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Dec 9, 2017
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.