Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/73986
Title: Two masks process for high aspect ratio inertial sensors with ajustable range
Authors: Iliescu, C.
Avram, M.
Miao, J.
Tay, F.E.H. 
Xu, G.
Keywords: Anodic bonding
Comb drive
High aspect ratio
Inertial sensors with adjustable range
Issue Date: 2004
Source: Iliescu, C.,Avram, M.,Miao, J.,Tay, F.E.H.,Xu, G. (2004). Two masks process for high aspect ratio inertial sensors with ajustable range. Proceedings of the International Semiconductor Conference, CAS 1 : 263-266. ScholarBank@NUS Repository.
Abstract: A two-mask process technology is proposed to fabricate silicon capacitive inertial sensors using comb drive structures. A conductive silicon wafer is anodically bonded on Pyrex glass substrate. The high aspect ratio silicon accelerometer structure was micromachined using DRIE and released from the glass substrate by further DRIE due to its notching effect. The spring stiffness was adjusted with another DRIE process. In this way, inertial sensors with different range can be process using same masks only by changing the spring stiffness. © 2004 IEEE.
Source Title: Proceedings of the International Semiconductor Conference, CAS
URI: http://scholarbank.nus.edu.sg/handle/10635/73986
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