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|Title:||Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor|
|Citation:||Zhang, J., Palaniappan, A., Su, X., Tay, F.E.H. (2005). Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor. Proceedings of SPIE - The International Society for Optical Engineering 5774 : 291-295. ScholarBank@NUS Repository. https://doi.org/10.1117/12.607331|
|Abstract:||Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.|
|Source Title:||Proceedings of SPIE - The International Society for Optical Engineering|
|Appears in Collections:||Staff Publications|
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