Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.607331
Title: Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor
Authors: Zhang, J.
Palaniappan, A. 
Su, X.
Tay, F.E.H. 
Keywords: Argon plasma
Mesoporous
PEG template
Silica
Sol-gel
Issue Date: 2005
Source: Zhang, J., Palaniappan, A., Su, X., Tay, F.E.H. (2005). Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor. Proceedings of SPIE - The International Society for Optical Engineering 5774 : 291-295. ScholarBank@NUS Repository. https://doi.org/10.1117/12.607331
Abstract: Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/73605
ISSN: 0277786X
DOI: 10.1117/12.607331
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