Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor

Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.607331

Title:	Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor
Authors:	Zhang, J. Palaniappan, A. Su, X. Tay, F.E.H.
Keywords:	Argon plasma Mesoporous PEG template Silica Sol-gel
Issue Date:	2005
Citation:	Zhang, J., Palaniappan, A., Su, X., Tay, F.E.H. (2005). Mesoporous silica thin films prepared by argon plasma treatment of sol-gel-derived precursor. Proceedings of SPIE - The International Society for Optical Engineering 5774 : 291-295. ScholarBank@NUS Repository. https://doi.org/10.1117/12.607331
Abstract:	Argon plasma is used to generate the mesoporous silica thin films from sol-gel-derived precursor. Poly(ethylene glycol)(PEG, MW=400) is employed as the template, i.e., the pore directing-agent as well as the binder. The influence of the plasma parameters on the mesoscopic properties of silica films are investigated by scanning electron microscopy (SEM), FT-IR, low-angle X-ray scattering (SAXS), and nitrogen isotherm adsorption.
Source Title:	Proceedings of SPIE - The International Society for Optical Engineering
URI:	http://scholarbank.nus.edu.sg/handle/10635/73605
ISSN:	0277786X
DOI:	10.1117/12.607331
Appears in Collections:	Staff Publications

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