Please use this identifier to cite or link to this item:
https://scholarbank.nus.edu.sg/handle/10635/72868
| Title: | Predicting plasma charging damage in ultra thin gate oxide by using nondestructive DCIV technique | Authors: | Guan, Hao Li, M.F. Zhang, Yaohui Cho, B.J. Jie, B.B. Xie, Joseph Wang, J.L.F. Yen, Andrew C. Sheng, George T.T. Dong, Zhong Li, Weidan |
Issue Date: | 1999 | Citation: | Guan, Hao,Li, M.F.,Zhang, Yaohui,Cho, B.J.,Jie, B.B.,Xie, Joseph,Wang, J.L.F.,Yen, Andrew C.,Sheng, George T.T.,Dong, Zhong,Li, Weidan (1999). Predicting plasma charging damage in ultra thin gate oxide by using nondestructive DCIV technique. International Integrated Reliability Workshop Final Report : 20-23. ScholarBank@NUS Repository. | Abstract: | The direct-current current-voltage (DCIV) method is presented to be an effective monitor for predicting plasma charging damage in ultra thin gate oxides. The DCIV experiments in deep submicron p-MOSFETs with 50 angstroms and 37 angstroms oxide and with various metal antenna structures clearly indicate plasma damage region on the wafers. High initial interface trap density, rapid latent degradation and low charge to soft breakdown were found at serious plasma damage region. | Source Title: | International Integrated Reliability Workshop Final Report | URI: | http://scholarbank.nus.edu.sg/handle/10635/72868 |
| Appears in Collections: | Staff Publications |
Show full item record
Files in This Item:
There are no files associated with this item.
Google ScholarTM
Check
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.