Please use this identifier to cite or link to this item: https://doi.org/10.1117/12.456835
Title: The optical and surface properties of ZnO thin films by PLD
Authors: Lu, Y.F. 
Ni, H.Q.
Ren, Z.M.
Keywords: Annealing
PLD
STS
XPS
ZnO
Issue Date: 2002
Citation: Lu, Y.F., Ni, H.Q., Ren, Z.M. (2002). The optical and surface properties of ZnO thin films by PLD. Proceedings of SPIE - The International Society for Optical Engineering 4426 : 217-220. ScholarBank@NUS Repository. https://doi.org/10.1117/12.456835
Abstract: ZnO films have been grown on silicon (100) and sapphire (0001) substrates by pulsed laser deposition (PLD). The influences of substrate temperature and laser fluence on the properties of the films were studied. The effects of annealing on the ZnO films were investigated by X-ray photoelectron spectroscopy (XPS). The surface properties of ZnO were studied by scanning tunneling spectroscopy (STS). The band edge emission properties of the ZnO films have been studied by the photoluminescence spectroscopy (PL).
Source Title: Proceedings of SPIE - The International Society for Optical Engineering
URI: http://scholarbank.nus.edu.sg/handle/10635/71987
ISSN: 0277786X
DOI: 10.1117/12.456835
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