Please use this identifier to cite or link to this item: https://doi.org/10.1116/1.1885012
Title: Process method to suppress the effect of phase errors in alternating phase shift masks
Authors: Singh, N.
Roy, M.M.
Mehta, S.S.
Adeyeye, A.O. 
Issue Date: 2005
Source: Singh, N., Roy, M.M., Mehta, S.S., Adeyeye, A.O. (2005). Process method to suppress the effect of phase errors in alternating phase shift masks. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 23 (2) : 540-546. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1885012
Abstract: We have developed a process method to suppress the effect of phase errors in alternating phase shift masks. Our method uses double exposure at reversed focus offsets to nullify the intensity imbalance caused by the phase errors. We have evaluated our technique using 120 nm half-pitch line space patterns and found it very successful with remarkable improvement in usable depth of focus without loosing exposure latitude. We also observed that our technique could bring immunity against the lens aberrations such as defocus and astigmatism. © 2005 American Vacuum Society.
Source Title: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
URI: http://scholarbank.nus.edu.sg/handle/10635/71511
ISSN: 10711023
DOI: 10.1116/1.1885012
Appears in Collections:Staff Publications

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