Please use this identifier to cite or link to this item:
|Title:||Process method to suppress the effect of phase errors in alternating phase shift masks|
|Citation:||Singh, N., Roy, M.M., Mehta, S.S., Adeyeye, A.O. (2005). Process method to suppress the effect of phase errors in alternating phase shift masks. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 23 (2) : 540-546. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1885012|
|Abstract:||We have developed a process method to suppress the effect of phase errors in alternating phase shift masks. Our method uses double exposure at reversed focus offsets to nullify the intensity imbalance caused by the phase errors. We have evaluated our technique using 120 nm half-pitch line space patterns and found it very successful with remarkable improvement in usable depth of focus without loosing exposure latitude. We also observed that our technique could bring immunity against the lens aberrations such as defocus and astigmatism. © 2005 American Vacuum Society.|
|Source Title:||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Feb 15, 2019
WEB OF SCIENCETM
checked on Jan 29, 2019
checked on Feb 9, 2019
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.