Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/70862
Title: Magnetic properties in patterned FeMn/NiFe bilayers with different etching depth
Authors: Guo, Z.B.
Li, K.B.
Han, G.C. 
Liu, Z.Y.
Luo, P.
Wu, Y.H. 
Issue Date: 2002
Citation: Guo, Z.B.,Li, K.B.,Han, G.C.,Liu, Z.Y.,Luo, P.,Wu, Y.H. (2002). Magnetic properties in patterned FeMn/NiFe bilayers with different etching depth. Digests of the Intermag Conference : ET10-. ScholarBank@NUS Repository.
Abstract: Magnetic properties in patterned FeMn/NiFe bilayers with different etching depth were analyzed. The detailed studies of exchange bias and magnetization reversal behaviors in the patterned sample with 3.5nm thick FeMn layer left in etched areas were performed. The origin of the phenomenon was attributed to the presence of antiferromagnetic domain walls by magnetization reversal in patterned sample.
Source Title: Digests of the Intermag Conference
URI: http://scholarbank.nus.edu.sg/handle/10635/70862
ISSN: 00746843
Appears in Collections:Staff Publications

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