Please use this identifier to cite or link to this item: https://doi.org/T129/008
Title: Evanescent wave interference lithography for surface nano-structuring
Authors: Zhou, Y.
Hong, M.H. 
Fuh, J.Y.H. 
Lu, L. 
Lukiyanchuk, B.S.
Issue Date: 2007
Source: Zhou, Y., Hong, M.H., Fuh, J.Y.H., Lu, L., Lukiyanchuk, B.S. (2007). Evanescent wave interference lithography for surface nano-structuring. Physica Scripta T T129 : 35-37. ScholarBank@NUS Repository. https://doi.org/T129/008
Abstract: Surface nano-structuring on photoresist beyond the diffraction limit has been investigated by using total internal reflection induced evanescence wave interference with a Lloyd's mirror. The size of the patterns can be down to 80 nm with the incident laser wavelength, λ, of 325 nm, less than λ/4 resolution. This may be attributed to laser induced evanescent wave, which has a shorter wavelength than that of the incident laser in air. The energy distribution of evanescent wave interference patterns was studied theoretically. It shows good agreement with the experiments. This technique can be used to improve traditional laser interference lithography to get smaller feature sizes with a simple modification by putting a prism in front of the sample only. © 2007 The Royal Swedish Academy of Sciences.
Source Title: Physica Scripta T
URI: http://scholarbank.nus.edu.sg/handle/10635/70217
ISSN: 02811847
DOI: T129/008
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

WEB OF SCIENCETM
Citations

8
checked on Nov 16, 2017

Page view(s)

24
checked on Dec 10, 2017

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.