Please use this identifier to cite or link to this item: https://doi.org/10.1109/IECON.2002.1185495
Title: Control and signal processing for photoresist processing in microlithography
Authors: Tay, A. 
Ho, W.K. 
Lim, K.W. 
Loh, A.P. 
Tan, W.W. 
Issue Date: 2002
Source: Tay, A.,Ho, W.K.,Lim, K.W.,Loh, A.P.,Tan, W.W. (2002). Control and signal processing for photoresist processing in microlithography. IECON Proceedings (Industrial Electronics Conference) 2 : 1468-1473. ScholarBank@NUS Repository. https://doi.org/10.1109/IECON.2002.1185495
Abstract: The lithography process is a critical step in the fabrication of nanostructures for integrated circuit manufacturing. In this paper, a summary is presented of several projects applying control and signal processing techniques to lithography. We begin with a presentation of a non-optical lithography process under development in our lab. The proposed lithography technique is based on chemically altering the surface in a spatially selective manner to achieve a patterned substrate. In addition to the exposure step, photoresist processing is also critical in lithography. Based on current limitations of photoresist thermal processing system, a new integrated system is designed to improve the performance of temperature sensitive chemically amplified photoresists used in deep-UV lithography. Two case studies where control and signal processing techniques have made an impact in photoresist processing are also presented.
Source Title: IECON Proceedings (Industrial Electronics Conference)
URI: http://scholarbank.nus.edu.sg/handle/10635/69723
DOI: 10.1109/IECON.2002.1185495
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