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|Title:||Comparative investigation of photoluminescence of In- and Si- doped GaN/AlGaN multi-quantum wells|
|Citation:||Sun, W.H.,Wang, L.S.,Chua, S.J. (2002). Comparative investigation of photoluminescence of In- and Si- doped GaN/AlGaN multi-quantum wells. Materials Research Society Symposium - Proceedings 719 : 371-376. ScholarBank@NUS Repository.|
|Abstract:||The GaN/AlGzN multi-quantum-wells (MQWs) have been grown via metalorganic chemical vapor deposition (MOCVD). Micro-Photoluminescence (PL) measurement has been performed on non-, In- and Si- doped GaN/AlGaN multi-quantum-well samples in the temperature ranges of 90-300 K. In the non-doped GaN/AlGaN multi-quantum-wells we observed the free exciton peak at 3.4587 eV at 90 K. Other exciton related peaks are located at 3.4346, 3.4177, 3.394, 3.3129 eV, which are probably associated with the strongly localized excitons involving the defects. In In-doped GaN/AlGaN MQWs, the free exciton peaks have a slight red-shift from 3.4712 to 3.4629 eV, but the PL intensities become stronger with increasing trimethylindium (TMIn) flow from 10.6 to 42.6-μmol/min. With Si-doping in the well layers, photoluminescence exhibits an envelope of exciton bands ranged from 3.4796 eV (free exciton) to 3.43915 eV. The excitonic peaks in the bands vary in intensity and position with sample temperature. In addition, we have also observed the LO phonon replica of AlGaN interacted by the laser line due to the resonance effect.|
|Source Title:||Materials Research Society Symposium - Proceedings|
|Appears in Collections:||Staff Publications|
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