Please use this identifier to cite or link to this item: https://scholarbank.nus.edu.sg/handle/10635/69000
Title: A partial SOI technology for single-chip RF power amplifiers
Authors: Cai, J.
Ren, C.
Liang, Y.C. 
Balasubramanian, N. 
Sin, J.K.O.
Issue Date: 2001
Citation: Cai, J.,Ren, C.,Liang, Y.C.,Balasubramanian, N.,Sin, J.K.O. (2001). A partial SOI technology for single-chip RF power amplifiers. Technical Digest - International Electron Devices Meeting : 891-894. ScholarBank@NUS Repository.
Abstract: The technology of forming partial SOI (silicon on insulator) platform on conventional bulk wafer is proposed. RF LDMOS devices with high power-added efficiency and on-chip high-Q value micro-inductors were fabricated for 2 GHz power amplifier applications by using the proposed technology. Devices were verified by the laboratory measurement results.
Source Title: Technical Digest - International Electron Devices Meeting
URI: http://scholarbank.nus.edu.sg/handle/10635/69000
ISSN: 01631918
Appears in Collections:Staff Publications

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