Please use this identifier to cite or link to this item: https://doi.org/10.1016/j.commatsci.2008.01.053
Title: Effects of wetting and misfit strain on the pattern formation of heteroepitaxially grown thin films
Authors: Guo, J.Y.
Zhang, Y.W. 
Lu, C.
Keywords: Kinetic Monte Carlo
Nanostructures
Quantum dots
Thin film growth
Thin film heteroepitaxy
Issue Date: Nov-2008
Source: Guo, J.Y., Zhang, Y.W., Lu, C. (2008-11). Effects of wetting and misfit strain on the pattern formation of heteroepitaxially grown thin films. Computational Materials Science 44 (1) : 174-179. ScholarBank@NUS Repository. https://doi.org/10.1016/j.commatsci.2008.01.053
Abstract: We investigate surface patterns of heteroepitaxially grown thin films using a three-dimensional kinetic Monte Carlo algorithm. Both the effects of elastic strain and wetting energy are taken into account. For the calculation of elastic strain energy induced by the lattice mismatch between the film and the substrate, a lattice discrete Green's function method is used and numerically evaluated. For the wetting effect, different function forms of wetting energy have been proposed to model the wetting intensity between thin film and the substrate materials. The effects of wetting and misfit strain together with other growth conditions such as deposition rate and temperature of the substrate are thus investigated. Three growth modes, i.e., Layer-By-Layer, Stranski-Krastanow (S-K), and Volmer-Weber (V-W) of thin films are demonstrated clearly in our investigations. The occurrence of S-K growth mode is affected by the competition between the wetting effect and the strain effect. © 2008 Elsevier B.V. All rights reserved.
Source Title: Computational Materials Science
URI: http://scholarbank.nus.edu.sg/handle/10635/64858
ISSN: 09270256
DOI: 10.1016/j.commatsci.2008.01.053
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