Please use this identifier to cite or link to this item: https://doi.org/25/255607
Title: Effect of ion bombardment on the synthesis of vertically aligned single-walled carbon nanotubes by plasma-enhanced chemical vapor deposition
Authors: Luo, Z.
Lim, S.
You, Y.
Miao, J.
Gong, H. 
Zhang, J. 
Wang, S.
Lin, J.
Shen, Z.
Issue Date: 25-Jun-2008
Source: Luo, Z.,Lim, S.,You, Y.,Miao, J.,Gong, H.,Zhang, J.,Wang, S.,Lin, J.,Shen, Z. (2008-06-25). Effect of ion bombardment on the synthesis of vertically aligned single-walled carbon nanotubes by plasma-enhanced chemical vapor deposition. Nanotechnology 19 (25) : -. ScholarBank@NUS Repository. https://doi.org/25/255607
Abstract: The synthesis of vertically aligned single-walled carbon nanotubes (VA-SWNTs) by plasma-enhanced chemical vapor deposition (PECVD) was achieved at 500-600°C, using ethylene as the carbon source and 1 nm Fe film as the catalyst. For growth of high-quality VA-SWNTs in a plasma sheath, it is crucial to alleviate the undesirable ion bombardment etching effects by the optimization of plasma input power and gas pressure. The resistibility of synthesized VA-SWNTs against ion bombardment etching was found to be closely related to the growth temperature. At relatively low temperature (500°C), the VA-SWNTs were very susceptible to ion bombardments, which could induce structural defects, and even resulted in a structural transition to few-walled nanotubes. For capacitively coupled radio frequency (rf) PECVD operating at moderate gas pressure (0.3-10 Torr), the ion bombardment etching effect is mainly dependent on the ion flux, which is related to the plasma input power and gas pressure. © IOP Publishing Ltd.
Source Title: Nanotechnology
URI: http://scholarbank.nus.edu.sg/handle/10635/64851
ISSN: 09574484
DOI: 25/255607
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