Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.2426971
Title: Dislocation junctions as barriers to threading dislocation migration
Authors: Quek, S.S.
Wu, Z.
Zhang, Y.-W. 
Xiang, Y.
Srolovitz, D.J.
Issue Date: 2007
Source: Quek, S.S., Wu, Z., Zhang, Y.-W., Xiang, Y., Srolovitz, D.J. (2007). Dislocation junctions as barriers to threading dislocation migration. Applied Physics Letters 90 (1) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2426971
Abstract: Level set simulations of dislocation dynamics in biaxially strained, heteroepitaxial films reveal interesting kinetic and thermodynamic mechanisms for blocking the migration of threading dislocations. Two dislocations on the same or on intersecting slip planes may react to form a threading dislocation segment that does not glide under the influence of the misfit strain. In the coplanar case, a kinetic barrier exists that slows down dislocation migration. For the reaction involving dislocations on intersecting planes, an energetic barrier impedes other advancing dislocations. These barriers create significant and frequent impediment to threading dislocation flow, resulting in pileups and high threading dislocation densities. © 2007 American Institute of Physics.
Source Title: Applied Physics Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/64845
ISSN: 00036951
DOI: 10.1063/1.2426971
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