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|Title:||Experimental investigation into the use of micro-extraction fields for electron beam testing|
|Authors:||Khursheed, A. |
|Keywords:||Electron beam test|
Transverse local field effects
|Source:||Khursheed, A.,Goh, S.P. (1997-09). Experimental investigation into the use of micro-extraction fields for electron beam testing. Microelectronic Engineering 34 (2) : 171-185. ScholarBank@NUS Repository.|
|Abstract:||In the electron beam testing of integrated circuits, local transverse electric fields cause error to voltage measurements. Presently, the solution is to place a 1-5 kV voltage extraction electrode a few millimetres above the specimen. An alternative method is to use a micro-extraction electrode that is of the same size as the structures to be probed. This paper describes an experimental investigation made into several types of micro-extraction layouts, and shows that they can be used to provide reliable voltage contrast measurements.|
|Source Title:||Microelectronic Engineering|
|Appears in Collections:||Staff Publications|
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