Please use this identifier to cite or link to this item:
|Title:||Simple tilt and height location monitoring of wafers|
|Authors:||Ng, T.W. |
|Source:||Ng, T.W., Tay, A., Ong, C.J. (2006-05). Simple tilt and height location monitoring of wafers. Optical Engineering 45 (5) : -. ScholarBank@NUS Repository. https://doi.org/10.1117/1.2203357|
|Abstract:||Good alignment is needed in various wafer processes. Reflectometry is a well-established technique that continues to be widely used to monitor the thickness of wafer thin films. The use of a reflectometer was investigated to detect incorrect tilt and height of wafer placement. We found that it could be used in the spectroscopic or the monochromatic mode and provided results whether the wafer was bare or coated. We also found that the technique was somewhat more sensitive to tilt of bare wafers, and more sensitive to height displacements of coated wafers. © 2006 Society of Photo-Optical Instrumentation Engineers.|
|Source Title:||Optical Engineering|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Feb 18, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.