Please use this identifier to cite or link to this item:
|Title:||Reverse nanoimprint lithography for fabrication of nanostructures|
Reverse Nanoimprint Lithography
|Source:||Tavakkoli, A.K.G., Ranjbar, M., Piramanayagam, S.N., Wong, S.K., Poh, W.C., Sbiaa, R., Chong, T.C. (2012-08). Reverse nanoimprint lithography for fabrication of nanostructures. Nanoscience and Nanotechnology Letters 4 (8) : 835-838. ScholarBank@NUS Repository. https://doi.org/10.1166/nnl.2012.1424|
|Abstract:||We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer. Copyright © 2012 American Scientific Publishers.|
|Source Title:||Nanoscience and Nanotechnology Letters|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Dec 7, 2017
WEB OF SCIENCETM
checked on Nov 23, 2017
checked on Dec 11, 2017
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.