Please use this identifier to cite or link to this item: https://doi.org/10.1166/nnl.2012.1424
Title: Reverse nanoimprint lithography for fabrication of nanostructures
Authors: Tavakkoli, A.K.G.
Ranjbar, M.
Piramanayagam, S.N.
Wong, S.K.
Poh, W.C.
Sbiaa, R.
Chong, T.C. 
Keywords: Molding Pressure
Nanofabrication
Residual Layer
Reverse Nanoimprint Lithography
Issue Date: Aug-2012
Source: Tavakkoli, A.K.G., Ranjbar, M., Piramanayagam, S.N., Wong, S.K., Poh, W.C., Sbiaa, R., Chong, T.C. (2012-08). Reverse nanoimprint lithography for fabrication of nanostructures. Nanoscience and Nanotechnology Letters 4 (8) : 835-838. ScholarBank@NUS Repository. https://doi.org/10.1166/nnl.2012.1424
Abstract: We investigate the applicability of reverse nanoimprint lithography (RNIL) to fabricate nanostructures. In this method, a thermal ultra-violet (UV) resist is first spin-coated onto a daughter mold directly and then the UV resist is transferred onto the desired surface by a UV-imprinting process at a very low temperature and low pressure. Discrete-track recording media at 50-nm track pitch were fabricated. The images from the scanning electron microscope showed that RNIL is capable of fabricating uniform patterns of nano-scale structures. Several advantages of RNIL over the existing methods are described, including the ease of using low molding pressure and temperature, the speed of imprinting, and the thinner residual layer. Copyright © 2012 American Scientific Publishers.
Source Title: Nanoscience and Nanotechnology Letters
URI: http://scholarbank.nus.edu.sg/handle/10635/57272
ISSN: 19414900
DOI: 10.1166/nnl.2012.1424
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