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|Title:||Laser nano-patterning for large area nanostructure fabrication|
|Authors:||Tan, L.S. |
|Citation:||Tan, L.S., Hong, M. (2008). Laser nano-patterning for large area nanostructure fabrication. International Journal of Optomechatronics 2 (4) : 382-389. ScholarBank@NUS Repository. https://doi.org/10.1080/15599610802438425|
|Abstract:||The laser nano-patterning technique described here makes use of laser irradiation through a transparent microlens array to generate nano-patterns over a large area in a short time. A femtosecond laser and an excimer laser were used to pattern phase change and photoresist thin films. Due to the ultra-short pulse duration of the femtosecond laser (800 nm/100 fs) and multi-photon absorption effect, nano-patterns down to about 50 nm in feature size were created in the phase change films by laser irradiation at an optimized laser power. By using a 248 nm/23 ns KrF excimer laser, feature sizes of approximately 80 nm can be obtained on a photoresist surface, which implies a high resolution of one third of the laser wavelength. Such small feature size shows that it is possible for the laser nano-patterning technique to overcome the optical diffraction limit for large area surface nano-structuring.|
|Source Title:||International Journal of Optomechatronics|
|Appears in Collections:||Staff Publications|
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