InGaN self-assembled quantum dots grown by metalorganic chemical-vapor deposition with indium as the antisurfactant

Abstract

Nanometer-scale InGaN self-assembled quantum dots have been formed in an InGaN single-quantum-well structure on a (0001) sapphire substrate with In as the antisurfactant using low-pressure metalorganic chemical-vapor deposition. High-resolution transmission electron microscopy reveals that the average dimensions of InGaN nanometer-scale structures are as small as 4 nm wide and 1.5 nm high. Strong photoluminescence emission of the InGaN quantum dots was observed at room temperature with an emission peak of about 2.56 eV (485 nm) and a full width at half maximum of about 150 meV (30 nm). The choice of In as the antisurfactant also avoids the incorporation of foreign atoms in the active layers. © 2002 American Institute of Physics.