Please use this identifier to cite or link to this item: https://doi.org/10.1063/1.1977196
Title: Effect of Pt on agglomeration and Ge out diffusion in Ni(Pt) germanosilicide
Authors: Jin, L.J.
Pey, K.L.
Choi, W.K. 
Fitzgerald, E.A.
Antoniadis, D.A.
Pitera, A.J.
Lee, M.L.
Chi, D.Z.
Rahman, Md.A.
Osipowicz, T. 
Tung, C.H.
Issue Date: 1-Aug-2005
Source: Jin, L.J., Pey, K.L., Choi, W.K., Fitzgerald, E.A., Antoniadis, D.A., Pitera, A.J., Lee, M.L., Chi, D.Z., Rahman, Md.A., Osipowicz, T., Tung, C.H. (2005-08-01). Effect of Pt on agglomeration and Ge out diffusion in Ni(Pt) germanosilicide. Journal of Applied Physics 98 (3) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.1977196
Abstract: The effect of Pt alloy in Ni (Pt∼5 and 10 at. %) on the agglomeration and Ge out diffusion in nickel germanosilicide formed on Si0.75 Ge0.25 (100) has been studied. A remarkable improvement in the agglomeration behavior with increasing Pt atomic percentage is observed by sheet resistance measurements while still maintaining Ni(Pt) monogermanosilicide phase between 400 and 800 °C. Ge out diffusion from the monogermanosilicide grains has been suppressed up to a temperature of 700 °C with the addition of Pt, evident by x-ray diffraction and micro-Raman spectroscopy. In addition, that improvement of surface morphology and suppression of Ge out diffusion with increasing Pt atomic percent is also confirmed by Rutherford backscattering and cross-sectional transmission electron microscopy. The improved morphology and agglomeration are explained by a grain-boundary model which includes kinetic effects. The suppression of Ge out diffusion from the germanosilicide grains is attributed to reduced atomic diffusion and the presence of stronger Pt-Si and Pt-Ge bonds due to the addition of Pt. © 2005 American Institute of Physics.
Source Title: Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/55760
ISSN: 00218979
DOI: 10.1063/1.1977196
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