Please use this identifier to cite or link to this item: https://doi.org/10.1143/JJAP.47.3077
Title: Device physics and performance optimization of impact-ionization metal-oxide-semiconductor transistors formed using a double-spacer fabrication process
Authors: Toh, E.-H.
Wang, G.H.
Chan, L.
Samudra, G.S. 
Yeo, Y.-C. 
Keywords: I-MOS
Impact-ionization
Optimization
Subthreshold swing
Issue Date: 25-Apr-2008
Source: Toh, E.-H., Wang, G.H., Chan, L., Samudra, G.S., Yeo, Y.-C. (2008-04-25). Device physics and performance optimization of impact-ionization metal-oxide-semiconductor transistors formed using a double-spacer fabrication process. Japanese Journal of Applied Physics 47 (4 PART 2) : 3077-3080. ScholarBank@NUS Repository. https://doi.org/10.1143/JJAP.47.3077
Abstract: In this paper, the impact-ionization metal-oxide-semiconductor (I-MOS) transistor structure is further optimized by utilizing a double-spacer fabrication process. This novel fabrication process allows for performance optimization through independent tuning of four individual implants which form a shallow source region, a lightly-doped drain region, a heavily-doped drain region, and a deep source region. The performance optimization is guided by detailed understanding of the device physics and will be described. The breakdown voltage needed for avalanche breakdown is optimized using the shallow source extension, and the lightly-doped drain extension reduces the impact of drain bias on breakdown voltage and hence the threshold voltage. The heavily-doped drain and deep source implants reduce the parasitic series resistance of the transistor. The double-spacer IMOS is fabricated and characterized. Detail analysis and physical explanation of the impact of drain/gate bias on the device characteristics will be given. In addition, excellent subthreshold swing and good device performance are achieved. © 2008 The Japan Society of Applied Physics.
Source Title: Japanese Journal of Applied Physics
URI: http://scholarbank.nus.edu.sg/handle/10635/55628
ISSN: 00214922
DOI: 10.1143/JJAP.47.3077
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

1
checked on Dec 6, 2017

WEB OF SCIENCETM
Citations

1
checked on Nov 21, 2017

Page view(s)

32
checked on Dec 10, 2017

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.