Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/54691
Title: A parametric study on surface roughness evaluation of semi-conductor wafers by laser scattering
Authors: Tay, C.J. 
Quan, C. 
Keywords: Laser diode
Laser scattering
Semi-conductor wafers
Surface roughness
Issue Date: 2003
Source: Tay, C.J.,Quan, C. (2003). A parametric study on surface roughness evaluation of semi-conductor wafers by laser scattering. Optik (Jena) 114 (1) : 1-6. ScholarBank@NUS Repository.
Abstract: A technique for measuring surface roughness of semi-conductor wafers in the nanometer range has been developed. The principle of the method is based on laser scattering from a rough surface. A tele-centric optical set-up is constructed to illuminate the test specimens and the scattered light field is recorded with a photo-diode sensor connected to a digital amplifier. A parametric method is proposed for the evaluation technique and results obtained are compared with those obtained using a conventional Taylor Hobson mechanical stylus profilometer. A set of roughness standards fabricated in accordance with BS 2634 and ISO 2632 is employed in the calibration process.
Source Title: Optik (Jena)
URI: http://scholarbank.nus.edu.sg/handle/10635/54691
ISSN: 00304026
Appears in Collections:Staff Publications

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