Please use this identifier to cite or link to this item: https://doi.org/10.1166/jnn.2007.789
Title: Fabrication of nanostructure on a polymer film using atomic force microscope
Authors: Jegadesan, S. 
Sindhu, S. 
Valiyaveettil, S. 
Keywords: AFM
Electrostatic nanolithography
Nanopattern
PAA
PMAA
Polymer film
Issue Date: Jun-2007
Source: Jegadesan, S., Sindhu, S., Valiyaveettil, S. (2007-06). Fabrication of nanostructure on a polymer film using atomic force microscope. Journal of Nanoscience and Nanotechnology 7 (6) : 2172-2175. ScholarBank@NUS Repository. https://doi.org/10.1166/jnn.2007.789
Abstract: SPM based lithographic techniques have been developed to pattern various substrates such as metals, semiconductors, and organic/polymer films due to its simplicity and high spatial precision nanostructure. Fabrication of nanostructure using polymeric materials is a key technique for the development of nanodevices. Here, we report the fabrication of nanostructures from polyacrylicacid (PAA) and polymethacrylicacid (PMAA) film on a silicon substrate using atomic force microscope (AFM). The formation of the nanopattern from the polymer film was studied using electrostatic nanolithography and the optimization of the conditions for nanopatterning of the polymer film was investigated with respect to the applied potential and translational speed of the AFM tip. The nano-structure of size 28 nm was created using the biased AFM tip on the PMAA film coated on Si(100) substrate and found that this method is a direct and reliable method to produce uniform nanostructures on a polymer film. Copyright © 2007 American Scientific Publishers All rights reserved.
Source Title: Journal of Nanoscience and Nanotechnology
URI: http://scholarbank.nus.edu.sg/handle/10635/53292
ISSN: 15334880
DOI: 10.1166/jnn.2007.789
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