Please use this identifier to cite or link to this item:
|Title:||Fabrication of nanostructure on a polymer film using atomic force microscope|
|Authors:||Jegadesan, S. |
|Citation:||Jegadesan, S., Sindhu, S., Valiyaveettil, S. (2007-06). Fabrication of nanostructure on a polymer film using atomic force microscope. Journal of Nanoscience and Nanotechnology 7 (6) : 2172-2175. ScholarBank@NUS Repository. https://doi.org/10.1166/jnn.2007.789|
|Abstract:||SPM based lithographic techniques have been developed to pattern various substrates such as metals, semiconductors, and organic/polymer films due to its simplicity and high spatial precision nanostructure. Fabrication of nanostructure using polymeric materials is a key technique for the development of nanodevices. Here, we report the fabrication of nanostructures from polyacrylicacid (PAA) and polymethacrylicacid (PMAA) film on a silicon substrate using atomic force microscope (AFM). The formation of the nanopattern from the polymer film was studied using electrostatic nanolithography and the optimization of the conditions for nanopatterning of the polymer film was investigated with respect to the applied potential and translational speed of the AFM tip. The nano-structure of size 28 nm was created using the biased AFM tip on the PMAA film coated on Si(100) substrate and found that this method is a direct and reliable method to produce uniform nanostructures on a polymer film. Copyright © 2007 American Scientific Publishers All rights reserved.|
|Source Title:||Journal of Nanoscience and Nanotechnology|
|Appears in Collections:||Staff Publications|
Show full item record
Files in This Item:
There are no files associated with this item.
checked on Nov 13, 2018
WEB OF SCIENCETM
checked on Nov 7, 2018
checked on Oct 27, 2018
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.