Please use this identifier to cite or link to this item: https://doi.org/10.1021/jp204113p
Title: Selective attachment of 4-bromostyrene on the Si(111)-(7 × 7) surface
Authors: Zhang, Y.P. 
He, J.H.
Xu, G.Q. 
Tok, E.S. 
Issue Date: 11-Aug-2011
Source: Zhang, Y.P.,He, J.H.,Xu, G.Q.,Tok, E.S. (2011-08-11). Selective attachment of 4-bromostyrene on the Si(111)-(7 × 7) surface. Journal of Physical Chemistry C 115 (31) : 15496-15501. ScholarBank@NUS Repository. https://doi.org/10.1021/jp204113p
Abstract: The covalent attachment of 4-bromostyrene on the Si(111)-(7 × 7) surface was investigated using X-ray photoelectron spectroscopy (XPS), high-resolution electron energy loss spectroscopy (HREELS), and density functional theory calculations. The HREELS spectra suggest that 4-bromostyrene covalently binds to the silicon surface through a [2 + 2]-like cycloaddition pathway between the external vinyl group and the adjacent adatom-rest atom pair of the Si(111)-(7 × 7) surface, forming 4-bromoethylbenzene-like binding configuration. The XPS results further confirm that only the vinyl double bond participates in the surface binding reaction, whereas the bromine atom remains unchanged during the adsorption process. The resulting 4-bromoethylbenzene-like structure on the Si(111)-(7 × 7) surface can be employed as a precursor for further chemical modification and functionalization. © 2011 American Chemical Society.
Source Title: Journal of Physical Chemistry C
URI: http://scholarbank.nus.edu.sg/handle/10635/53156
ISSN: 19327447
DOI: 10.1021/jp204113p
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
There are no files associated with this item.

SCOPUSTM   
Citations

7
checked on Dec 12, 2017

Page view(s)

44
checked on Dec 8, 2017

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.