Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/36427
Title: DEVELOPMENT OF THREE DIMENSIONAL SILICON MICRO- AND NANO-MACHINING
Authors: SARA AZIMI
Keywords: silicon, three-dimensional, free-standing, multilevel, micro- and nano-fabrication, buried channels, porous silicon, electrochemical anodization
Issue Date: 28-Sep-2012
Source: SARA AZIMI (2012-09-28). DEVELOPMENT OF THREE DIMENSIONAL SILICON MICRO- AND NANO-MACHINING. ScholarBank@NUS Repository.
Abstract: A novel process for fabricating true, three-dimensional (3D) silicon and porous silicon components at micro- and nano-scale dimensions is developed. Using this process, structures which can be two- and three-dimensional, free-standing, arbitrary-shaped, or curved, and with features at multiple heights, and combined at micro- and nano-scale dimensions are fabricated in a single etch step out of bulk silicon. This process is based on high-energy ion irradiation, such as 100 keV to 2 MeV protons and helium ions, of p-type silicon wafers. Fundamental aspects of this silicon machining work are also studied for this thesis. In addition, applications of this machining process in different fields such as micro/nanofluidics, micro-electromechanical systems (MEMS), photonics, nano-scale depth machining, nanostencil mask fabrication and patterned silicon-on-insulator (SOI) fabrication are explored in this thesis. Further development of this machining technique may lead to fabrication of highly compact custom-shaped 3D systems-on-a-chip to develop future micro- and nano-technologies.
URI: http://scholarbank.nus.edu.sg/handle/10635/36427
Appears in Collections:Ph.D Theses (Open)

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