Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/35304
Title: MICROMACHINING USING HIGH ENERGY LIGHT IONS
Authors: WATT, FRANK 
SPRINGHAM, STUART VICTOR
OSIPOWICZ, THOMAS 
BREESE, MARK 
Issue Date: 14-May-1998
Source: WATT, FRANK,SPRINGHAM, STUART VICTOR,OSIPOWICZ, THOMAS,BREESE, MARK (1998-05-14). MICROMACHINING USING HIGH ENERGY LIGHT IONS. ScholarBank@NUS Repository.
Abstract: Structures of microminiature dimensions are formed by scanning a nearly parallel beam of high energy light ions across the surface of a resist material such as PMMA in a predetermined pattern. The resulting chemical changes in the exposed resist material allows a chemical developer to remove the exposed material while leaving the unexposed material substantially unaffected. In addition because the ions have a well defined range in the material depending on their energy, the resist can be exposed to a predetermined and well defined depth. By this method resist structures of three dimensional complexity can be micromachined. This is achieved by simultaneously scanning the beam and orientating the resist layer in a controlled manner. Further enhancement may be achieved by the use of multiple deposition and exposure of resist layers. These resist microstructures may be further utilised to produce microstructures in other materials by the application of processes such as electroplating and micromoulding.
URI: http://scholarbank.nus.edu.sg/handle/10635/35304
Appears in Collections:Staff Publications

Show full item record
Files in This Item:
File Description SizeFormatAccess SettingsVersion 
WO1998020517A1.PDF538.64 kBAdobe PDF

OPEN

PublishedView/Download

Page view(s)

97
checked on Dec 15, 2017

Download(s)

41
checked on Dec 15, 2017

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.