Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/28185
Title: Control of Resist Processing in Lithography
Authors: KIEW CHOON MENG
Keywords: Thickness Estimation, Develop Step, Process Control, Feedforward Control, Minimax
Issue Date: 9-Jun-2008
Source: KIEW CHOON MENG (2008-06-09). Control of Resist Processing in Lithography. ScholarBank@NUS Repository.
Abstract: This thesis proposes control strategies to reduce critical dimension (CD) variations by improving various steps/aspects of the lithography process. Firstly, real-time control of develop step is performed using a reconfigurable bake/chill system with an online film thickness estimation. Then, a feed-forward control strategy is applied during post-exposure-bake step to reduce CD variations caused by poor temperature uniformity control and temperature disturbances caused by placement of cold wafers on the bakeplate of the same bake/chill system mentioned earlier. Lastly, variations in lithography process such as process drifts and deterioration of equipment often increase sensitivity of plant model to disturbances. A robust run-to-run controller that uses minimax function is proposed and used to minimize the worst predicted scenario when the bounds of these variations are known.
URI: http://scholarbank.nus.edu.sg/handle/10635/28185
Appears in Collections:Ph.D Theses (Open)

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