Please use this identifier to cite or link to this item: http://scholarbank.nus.edu.sg/handle/10635/15883
Title: Metallic thin film on SiGe/Si substrates
Authors: ZHANG ZHENG
Keywords: Ni, Si1-xGex, Virtual substrate, Growth mode, Interfacial reaction, XPS
Issue Date: 6-Apr-2009
Source: ZHANG ZHENG (2009-04-06). Metallic thin film on SiGe/Si substrates. ScholarBank@NUS Repository.
Abstract: In this thesis, in-situ XPS and ex-situ AFM have been employed to probe the thermal stability of Si0.8Ge0.2(001) virtual substrate (VS), the interfacial reaction and growth mode of Ni thin film on Si0.8Ge0.2 VS at room temperature (RT), and the germanosilicide phase transformation at high temperatures. Similar studies on Si(001) and Ge(001) substrates were also carried out for comparison. The Si0.8Ge0.2 VS remained stable in composition and unchanged in surface morphology below 500oC. Above 500oC, Ge desorbed from surface, leading to a decrease in Ge concentration and formation of macroscopic pits on the surface. Ni growth proceeded via a pseudo-layer-by-layer mode on H-terminated Si, Ge, Si0.8Ge0.2 and clean Ge surfaces, while it changed to small close-packed island growth on the clean Si and Si0.8Ge0.2 surfaces. The ultra-thin Ni films (~2-6A) reacted strongly with the Si, Ge and Si0.8Ge0.2 substrates to form thin, amorphous NiSi-like, NiGe-like and NiSi0.8Ge0.2-like layers at RT on both clean and hydrogen terminated surfaces. Upon annealing, they transformed to NiSi2, NiGe and Ni(Si1-yGey)2 (y<0.2) phases, respectively. Continuous films at RT became 3D rectangular islands on all three substrates when annealed beyond 400oC.
URI: http://scholarbank.nus.edu.sg/handle/10635/15883
Appears in Collections:Ph.D Theses (Open)

Show full item record
Files in This Item:
File Description SizeFormatAccess SettingsVersion 
Acknowledgement_V4.pdf256.93 kBAdobe PDF

OPEN

NoneView/Download
Chapter 1 Literature Reviews _V11.pdf362 kBAdobe PDF

OPEN

NoneView/Download
Chapter 2 Experimental _V3.pdf458.91 kBAdobe PDF

OPEN

NoneView/Download
Chapter 3 Thermal Stability of Si1-xGex Virtual Substrates _V12.pdf741.22 kBAdobe PDF

OPEN

NoneView/Download
Chapter 4 Room Temperature Growth of Ni Thin Films on Si, Ge, Si1-xGex Substrates _V6.pdf811.72 kBAdobe PDF

OPEN

NoneView/Download
Chapter 5 Oxidation of Ni Thin Films on Si Ge Si1-xGex Virtual Substrates at Room Temperature.pdf590.17 kBAdobe PDF

OPEN

NoneView/Download
Chapter 6 High Temperature Reaction Between Ni and Si Ge Si1-xGex Virtual Substrates _V7.pdf674.32 kBAdobe PDF

OPEN

NoneView/Download
Chapter 7 Conclusions & Future Work _V5.pdf380.6 kBAdobe PDF

OPEN

NoneView/Download

Page view(s)

335
checked on Dec 11, 2017

Download(s)

1,751
checked on Dec 11, 2017

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.